本文叙述了辉光放电等离子体源的等离子体源离子注入。
In this paper, a glow discharge plasma source ion implantation technique is described.
这一分析方法对实际等离子体源离子注入应用具有重要的指导作用。
This method would be very helpful to the design of practical plasma source ion implantation processes.
等离子体源离子注入技术是一种新型的非视线的离子注入材料表面改性技术。
Plasma source ion implantation is a new non-line of sight ion implantation technique for surface modification of materials.
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