... 强密扣分法 sealinglock 气相沉积技术 vapor deposition technique 去毛刺技术 ragging technique ...
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化学气相沉积技术 CVD ; Chemical Vapor Deposition ; [化工] chemical vapour deposition technique
纳米薄膜气相沉积技术 NFVDT
物理气相沉积技术 PVD ; physical vapor deposition
金属化学气相沉积技术 Metal-organic Chemical Vapor Deposition ; MOCVD
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different substrate temperatures (T_s).
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
Microcrystalline silicon thin films prepared at different deposition parameters using very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD).
等离子体化学气相沉积技术制备氢化硅薄膜工艺条件成熟稳定而成为薄膜制备的首选方法。
Plasma enhanced chemical vapor deposition (PECVD) technique is the primary method which is used to prepare hydrogenated silicon film.
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