With the rapid development on fabrication of Integration Circuit Technology, Dry Etch has become one of the most major technology on the patterned etch.
随着集成电路制造技术的迅猛发展,干法刻蚀技术,早已在特征图形形成方面,成为最主要的工艺技术之一。
参考来源 - 金属刻蚀工艺开发与评价·2,447,543篇论文数据，部分数据来源于NoteExpress
An epitaxial deposition process including a dry etch process, followed by an epitaxial deposition process is disclosed.
本发明提供一外延沉积工艺，其包含干式蚀刻工艺与后续的外延沉积工艺。
Improvement of Dry ETCH process as the main means, and the improvement of the whole Aluminum ETCH flow as accessorial means. We want to get effective solution of Aluminum corrosion defect.
寻求以改善干法蚀刻的工艺为主要手段，通过改进整个铝金属工艺流程为辅助手段，能够有效的改善铝金属腐蚀的缺陷的解决方案。
Based on ash chamber of metal etch this paper describes the full process of dry clean development and evaluation.
本文以金属刻蚀去胶腔为背景，简述干刻清洗工艺开发和评价过程。
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