在这个系统中沉积室(deposition chamber)是由石英管(quartz tube)所构成,而芯片则是竖立于一个特制的固定架上,这是一种『批次型式』(batch-type)的沉积制程方式。
基于48个网页-相关网页
...n Pump),而采用回旋帮浦(Rotary Pump)与 涡轮分子帮浦 ( Turbo Molecular Pump )之组合,可使成膜室真空腔体(Deposition Chamber)达到约1×10-9torr的最低压力(一般实验可达到7~8×10-9torr的压力).
基于8个网页-相关网页
double chamber vacuum deposition system 双室真空淀积系统
Chemical Vapor Deposition Vacuum Chamber 化学气相沈积真空腔体
This invention describes a method for cleaning a deposition chamber that is compatible with large area deposition.
本发明描述了一种用于清洗沉积室的方法,所述方法与大面积沉积是相容的。
In this paper differential equations of grain moving in the deposition chamber were developed based on Newton's Second Law.
本文根据牛顿第二定律,建立了惯性分离室内包含多因素的颗粒运动微分方程序。
The formation of "black layer" is also controlled by the nitrogen potential and system temperature in the deposition chamber.
同时,“黑色层”能否形成还与气氛氮势、体系温度有关。
应用推荐