This invention describes a method for cleaning a deposition chamber that is compatible with large area deposition.
本发明描述了一种用于清洗沉积室的方法，所述方法与大面积沉积是相容的。
In this paper differential equations of grain moving in the deposition chamber were developed based on Newton's Second Law.
本文根据牛顿第二定律，建立了惯性分离室内包含多因素的颗粒运动微分方程序。
The formation of "black layer" is also controlled by the nitrogen potential and system temperature in the deposition chamber.
同时，“黑色层”能否形成还与气氛氮势、体系温度有关。
Special importance were attached to the design and calculation of deposition chamber, vacuum system, sample system, sputtering cathode and control system.
作为重点，对真空室、真空系统、工件架、磁控溅射靶、控制系统等进行了相应的设计分析和计算。
The method can substitute a wet cleaning method to clean completely the deposition chamber, is easy and rapid to operate, can reduce the idle time of equipment and improve the productivity.
本发明的化学气相沉积室的清洁方法，可以代替湿法清洁方法实现对沉积室的全面清洁，操作方便、快捷，并可减少设备的闲置时间，提高生产效率。
Deposition was carried out by passing gaseous mixture of hydrocarbon and hydrogen through a heated reaction chamber, in which a hot tungsten filament was held near the substrates.
合成过程中碳氢化合物和氢气的混合气体通入由热丝辐射加热的沉积室内，基体硅片置于热丝下方附近。
This design aims at the characteristics of magnetron sputtering deposition, and mainly ameliorate the design of the chamber of the magnetron sputtering machine.
本设计主要对磁控溅射镀膜机真空室进行改进设计，以改善磁控溅射镀膜的工艺条件。设计内容包括真空室及相关机构设计、计算。
This design aims at the characteristics of magnetron sputtering deposition, and mainly ameliorate the design of the chamber of the magnetron sputtering machine.
本设计主要对磁控溅射镀膜机真空室进行改进设计，以改善磁控溅射镀膜的工艺条件。设计内容包括真空室及相关机构设计、计算。
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