...常用的 薄膜的制备方法有很多，有蒸镀法（evaporation method）、溅镀法（sputtering method）以及化学气相 沉积法（CVD method）等。
基于16个网页-相关网页
flame CVD method 火焰CVD法
CVD method activated carbon fiber 气相法活性炭纤维
the cvd method cvd法
wave plasma cvd method 微波等离子体化学气相沉积方法
carbon-assisted CVD method 碳辅助化学气相沉积法
chemical vapor deposition cvd method 化学气相沉积法
B-doped diamond films were grown on graphite substrates by hot filament assisted CVD method (HFCVD).
采用固体三氧化二硼，用热丝辅助化学气相沉积法在石墨衬底上沉积了掺硼金刚石涂层。
Diamond film wafers with different thickness were prepared by high power DC arc plasma jet CVD method.
采用高功率直流电弧等离子体cvd工艺制备了不同厚度的无裂纹自支撑金刚石厚膜。
Currently, CVD method is a widely used method of fabrication, due to its low demand in equipment, simple operation and low cost.
由于CVD法对设备要求低，操作简单，成本低，是目前广泛采用的制备方法。
应用推荐