The former mainly includes sputtering, PLD(pulse laser deposition) and molecular beam epitaxy, while the latter includes chemical vapor deposition, spray pyrolysis and sol-gel methods and so on.
前者主要包括溅射、脉冲激光沉积和分子束外延等;后者则涵盖化学气相沉积、喷雾热解和溶胶-凝胶法等。
参考来源 - ZnO薄膜的制备方法、性质和应用·2,447,543篇论文数据，部分数据来源于NoteExpress
Firstly, the theory and fabrication of molecular beam epitaxy are described in detail.
本文首先详细介绍了分子束外延设备的原理和构造。
Chemical beam epitaxy (CBE), a novel technique for thin-film crystal growth, is introduced.
本文介绍了薄膜晶体生长的最新技术——化学束外延(CBE)。
In addition, such preparation methods as molecular beam epitaxy and laser ablation also see some applications.
此外，分子束外延生长、激光消融等制备方法也有一定的应用。
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