衬底温度对Fe-N薄膜结构、 形貌及磁性能的影响 - TNMSC 关键字: Fe-N薄膜; 衬底温度; 磁性能[gap=1198]Key words: Fe-N thin films; substrate temperature; magnetic properties
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使用旋转的圆筒形阴极电弧沉积技术和物理/机械和抗腐蚀特性的影响衬底温度(TSUB)的和偏置电压(VSUB),氮化铬(CrN)薄膜已被高速钢(HSS)的衬底上淀积薄膜全面的调查。
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Substrate temperature,deposition pressure and sputtering power have great influences on the film surface morphology.
2.衬底温度、沉积压强和溅射功率等因素对薄膜的表面形貌有很大的影响。
参考来源 - 透明的高导电近红外反射ZnO:Ga薄膜的制备及特性研究The result show that when temperature of substrate was 800,CCO thin films has good crystallinity,and grow alone(001)oriented in c-axis.
XRD测量结果表明:在衬底温度为800度时,CCO薄膜具有较好的结晶性,并沿c轴(001)方向生长。
参考来源 - 层状钴基热电薄膜的制备及其激光感生热电电压效应We discover that poly-silicon thin films can be gained when the substrate temperature is 200 0C, which has not been reported yet at home and abroad.
我们发现,当衬底温度仅为200℃时,即能沉积到多晶硅薄膜。 这在国内外都未见报导过。
参考来源 - 以SiCl·2,447,543篇论文数据,部分数据来源于NoteExpress
给出了不同衬底温度下淀积薄膜中硼深度分布的一些特征。
Some of the characteristics of boron depth profile in these films were presented.
研究了衬底温度对薄膜结构、表面形貌以及介电性能的影响。
Investigated were the effects of substrate temperature on the structures and surface morphology, dielectric properties of films.
对制备薄膜的结构和光电性质及衬底温度的影响进行了详细的研究。
Structural, optical and electrical properties of the film dependence of substrate temperature are investigated in detail.
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