研制了一种新的大面积微波等离子体源。
A new large area microwave plasma source has been developed.
文章介绍了空间等离子体源与测试系统的设计方法。
The design method for space plasma source and measurement system is introduced in this paper.
本文叙述了辉光放电等离子体源的等离子体源离子注入。
In this paper, a glow discharge plasma source ion implantation technique is described.
这一分析方法对实际等离子体源离子注入应用具有重要的指导作用。
This method would be very helpful to the design of practical plasma source ion implantation processes.
采用微波三探针研究了环形波导等离子体源阻抗特性随运行参数的变化。
A microwave three probe system has been used to study the changes of annular waveguide plasma source impedance with operational parameters.
超短脉冲激光等离子体源作用时间超短，能量密度高，可调谐，易于控制。
The ultrashort pulse laser plasma source works in ultrashort time, with high energy density and is able to be tuned, controlled easily.
等离子体源离子注入技术是一种新型的非视线的离子注入材料表面改性技术。
Plasma source ion implantation is a new non-line of sight ion implantation technique for surface modification of materials.
使用该等离子体源以乙醇蒸汽和氢气为气源在石英玻璃管外表面沉积金刚石膜。
Diamond films had been deposited on quartz tube with the gas mixture of ethanol steam and hydrogen by the plasma source.
采用等离子体源离子注入方法，将氮离子注入纯铁粉中，对样品进行穆斯堡尔谱研究。
Mssbauer measurements have been carried out for pure iron powder samples, the whose surface was implanted with nitrogen ions by plasma source ion implantation techniques.
采用中频交流脉冲等离子体源进行了抑制弧光放电和空心阴极效应以及离子渗氮工艺的实验。
The power has been used to conduct two sorts of experiments including both to restrain arc discharge and to control hollow cathode discharge.
利用可消融材料制成毛细管，在其两端阳极与中空阴极间进行大功率放电，形成高压等离子体源。
The plasma produced in ablative capillaries by high power discharges between an anode and a hollow cathode can be used as sources for electrothermal/electrothermal chemical launchers.
由于尺度放大，氧等离子体源各组件间会出现失配现象，直接导致系统性能差、能耗高、维护任务重。
Owing to the enlarging of scale, components of plasma source no longer match with each other, resulting in performance descending, high energy cost and more frequent maintenance.
本发明涉及离子注入机imp，包括脉冲等离子体源spl、衬底支承台PPS和所述台的电源alt。
The invention relates to an ion implanter (imp) comprising a pulsed plasma source (SPL), a substrate support plate (PPS) and a power supply (ALT) for said plate.
对国际上普遍采用的两种EUV光源：放电等离子体源(DPP)和激光等离子体源(LPP)进行了多方面比较。
The general EUV sources, discharge produced plasma (DPP) and laser produced plasma (LPP), were compared in many respects.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
真空室内的气体等离子体可由热灯丝或射频放电产生，4另外还配置了4个金属等离子体源、两套磁控溅射靶和冷却靶台。
The plasma can be 4 generated by hot-cathode discharge or RF discharge of gas. In addition, the device has four metal plasma sources, two magnetron sputtering targets, cold and hot target supports.
本文就是为空间电离层环境模拟器研制的扩散型极低气压、低电子温度和极低密度的紧凑型电子回旋共振等离子体源的研制。
A compact ECR plasma source, the strengths of which are its ultra low electron temperature, its low pressure and its ultra low density, was developed and built for such a simulator.
所述方法包括通过至少两个注射点且在用于反应性物质的等同路径上以均匀的方式将被活化的气体从远程等离子体源输送至所述室中的区域。
It comprises transport of activated gas from a remote plasma source to an area in the chamber in a uniform way through at least two injection points on equivalent paths for the reactive species.
本文综述了ECR放电的基本物理过程和实验研究概况，介绍了ECR等离子体在表面处理、镀膜和离子源等方面应用的最新结果。
This article reviews the basic physics of ECR discharge and experimental research, and describes new applications of ECR plasma in surface processing, plasma coating and ion source.
结果表明，随着工件阴极电压、源极电压和气压的增加，等离子体密度增大。
It is shown that the plasma density increases with increasing workpiece voltage, source voltage and gas pressure.
本发明是用微波等离子体矩作电离源的一种新型离子化色谱检测器。
This invention is a chromatographic detector in which the ion source is a microwave plasma torch.
为加热HT-6M托卡马克等离子体而研制的IS-A十厘米双潘宁离子源具有强流、大功率、高质子比等特点。
IS-A type 10cm duopigatron ion source that was made for heating plasma In the HT-6M Tokamak has high current, high power and high proton composition.
环形波导内侧开有多个狭缝用来激励产生等离子体。 利用该源研究了气压对等离子体参数、击穿功率和熄灭功率的影响。
The source has been used to study the effect of pressure on argon plasma parameters and microwave power for plasma ignition and extinction.
环形波导内侧开有多个狭缝用来激励产生等离子体。 利用该源研究了气压对等离子体参数、击穿功率和熄灭功率的影响。
The source has been used to study the effect of pressure on argon plasma parameters and microwave power for plasma ignition and extinction.
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