玻璃衬底与非晶硅膜之间的非晶氮化硅膜对非晶硅膜的晶化没有明显影响。
The amorphous silicon nitride film between amorphous silicon film and glass substrate is found to have no any effects on the crystallization.
我们已经发现，可以通过操作某些膜沉积参数来调节单层氮化硅膜的应力。
We have discovered that it is possible to tune the stress of a single-layer silicon nitride film by manipulating certain film deposition parameters.
探讨如何用电子回旋共振化学气相沉积(ECRCVD)设备制备非晶态氮化硅介质膜和光学膜。
This article is about how to use Electron Cyclotron Resonance Chemical Vapor Deposition (ECRCVD) method to prepare amorphous silicon nitride (SiN_x) film.
氮化硅、二氧化硅双层透明膜可用作硅PIN光电探测器抗反射膜。
Double-layer transparent films, silicon nitride and silicon dioxide can be used as antireflection coating on silicon PIN photodetector.
硅基太阳能电池中，氮化硅用作钝化膜和减反射膜；
In the fabrication of solar cell, silicon nitride thin film is used as passivating film and anti-reflecting film.
依据分析结果，选择氮化硅作为梁材料，采用梁膜一体结构，激励和检测方式为电热激振、电阻拾振。
Finally, Si3N4 beam and Si reflecting membrane are selected with an integrated structure, using electrothermal excitation and piezoresistive detection.
依据分析结果，选择氮化硅作为梁材料，采用梁膜一体结构，激励和检测方式为电热激振、电阻拾振。
Finally, Si3N4 beam and Si reflecting membrane are selected with an integrated structure, using electrothermal excitation and piezoresistive detection.
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