提出一种新的步进扫描投影光刻机工件台方镜不平度测量方法。
A novel in-situ non-flatness measurement method of wafer stage mirrors in a step-and scan lithographic tool is presented.
介绍投影光刻机设备的晶片传输系统中切边探测和晶片预对准技术。
Mostly introduction the of detection and the of prealignment technology of the Wafer Loader system in the Projection-Lithography equipment.
掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).
大视场投影光刻物镜是光学系统中的一种特殊的形式，其设计加工要求高。
The large field projection lithography lens is a special optical lenses form, which put an high demands on the design and processing both for mechanical and optical.
在投影光刻中矢量衍射理论适用于研究照明光的偏振态对空间成像的影响。
Vector diffraction theory is applied for the investigation of the effects of the polarization state of the illumination light on the aerial images in the optical lithography.
实验结果表明该方法可以高精度、有效地获得投影光刻机像质校正灵敏矩阵。
Experiment results show that the image quality correction sensitive matrix can be obtained in situ by this method with a high accuracy.
对于大口径精密投影光刻制版镜头来说，透镜的应力变形和中心误差对整个系统的成像质量有较大影响。
For big aperture's precision photolithographic plate-making lenses, the stress distortion and centering errors of lenses can make a bad effect on imaging quality.
本文从最基本的角度出发，介绍了亚微米分步重复投影光刻机中的一项新的检测技术——基准校正技术。
A new detecting technique-correction technique for datum in submicron DSW is introduced from the basic point of view.
提出了针对大视场投影光刻物镜畸变的计算方法，并在完成的畸变特性测量装置上进行了8英寸的硅片测量。
The calculative method of the large field projection lithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed.
本文从投影光刻机的图形传递要求出发，导出投影光刻机各主要光学系统的具体要求，并讨论这些参数确定的局限性。
The specific parameters of main optical system are deduced from the requirement of pattern transfer for the projection aligner. The limit of these parameters is discussed.
随着光刻特征尺寸的不断减小，尤其是随着分辨力增强技术的使用，像质参数的原位检测已成为先进的投影光刻机中不可或缺的功能。
As feature size shrinks, especially with the use of resolution enhancement techniques, accurate measurement of image quality parameters in situ is indispensable for the lithographic tools.
具有角度限制的电子束投影曝光技术有可能成为21世纪最有潜力的纳米光刻技术之一。
The projection electron beam lithography with angular limitation(PEBL)is potentially one of the most attractive techniques for nano lithography in the21st Century.
主要介绍一种光刻机投影物镜温度补偿控制的原理及控制算法。
The principle and control algorithm of temperature compensation for Sub Micron projection lithography objectives are introduced.
介绍了光刻投影系统的组合集成，详细分析了该系统的成像特点及光学性能。
Integration of the system is described, the characteristics of the photolithographic imaging system are analyzed in detail.
在高数值孔径、低工艺因子的光刻技术中，投影物镜彗差对光刻质量的影响变得越来越突出，因而需要一种快速、高精度的彗差原位测量技术。
In high numerical aperture and low technic factor lithography process, degradation of the image quality because of the coma aberration in the projection lens has become a serious problem.
介绍了调整扫描投影式光刻机畸变的几种方法。
Essay brief a few kind methods of correcting distortion of Scan Projection Mask Alignment System.
对两种主要的光刻投影物镜安装方式进行了研究，并对各自特点进行了讨论。
Two main installation methods of lithography projection lens were studied in this paper, and their characteristics were discussed.
设计了一种具有方形光斑的新型激光直写系统，用双远心投影透镜组获得方形光斑并以逐点光刻模式运行， 改善了衍射图形光刻质量， 提高了系统运行效率。
In this paper, based on the technique of laser micro-fine cladding and flexibly direct writing, micro-fine conductive lines of high quality and high property are fabricated on glass substrates.
设计了一种具有方形光斑的新型激光直写系统，用双远心投影透镜组获得方形光斑并以逐点光刻模式运行， 改善了衍射图形光刻质量， 提高了系统运行效率。
In this paper, based on the technique of laser micro-fine cladding and flexibly direct writing, micro-fine conductive lines of high quality and high property are fabricated on glass substrates.
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