用亚稳态氖原子束进行了原子光刻实验。
The atomic lithography experiments were carried out by use of a metastable neon atomic beam.
提出了优化实验参数、增加束掩模和利用刻蚀技术三种改善原子光刻实验的方法。
Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.
在原子光刻中，对不同原子在各种条件下的沉积过程的研究是具有非常重要的意义的。
The research of the processes of atomic deposition using different atoms in various conditions has an important significance.
纳米结构制作是纳米技术的重要组成部分，原子光刻技术是纳米图形制作的一项新方法。
Fabrication of nanostructures is an important part of nanotechnology, and atom lithography technology is a new nanostructure fabrication method.
弥补了原子光刻技术中利用激光驻波场控制原子堆积只能制作单一量子点、线等周期性图形的不足。
It can make up the shortage that only the periodic dots or lines can be made when using laser standing wave field to control the atoms to stack on wafer in atom lithography.
原子全息光刻即采用二元计算全息片掩模来操纵原子，实现微细结构的制作。
Atom hologram lithography employs binary computer generated hologram to handle atoms for making microstructure.
原子全息光刻即采用二元计算全息片掩模来操纵原子，实现微细结构的制作。
Atom hologram lithography employs binary computer generated hologram to handle atoms for making microstructure.
应用推荐