提出了一种用于光刻装置的对准系统。
A novel alignment system is presented for lithographic apparatus.
对准方法，对准基底，光刻装置和器件制造方法。
Aligning method, aligning substrate, photoetching device and component manufacturing method.
光刻装置，器件制造方法，以及由此制造的器件。
Lithographic apparatus, device manufacturing method, and device manufactured thereby.
光刻装置，镜元件，器件制造方法，及束传送系统。
Photoetching device, mirror element, device producing method and beam transfering system.
校准光刻装置的方法，对准方法，计算机程序，光刻装置和器件制造方法。
A method of calibrating a lithographic apparatus, an alignment method, a computer program, a lithographic apparatus and a device manufacturing method.
制备基底的方法，测量方法，器件制造方法，光刻装置，计算机程序和基底。
Method of preparing a substrate, method of measuring, device manufacturing method, lithographic apparatus, computer program and substrate.
准分子激光作为当前光刻装置的主要光源，要求其输出激光光束强度分布尽量均匀。
The excimer laser as the main light source of photolithographic device, whose energy distribution is required as homogeneous as possible.
本发明的课题是提供在半导体装置制造的光刻工艺中使用的形成抗蚀剂下层膜的组合物。
The invention provides a composition for under-resist film formation which is for use in a lithographic process for producing a semiconductor device.
浸没液体传送装置是浸没光刻设备中的一个关键组件，用来实现缝隙内液体的平稳注入和回收，同时保证无泄漏和气泡产生。
The fluid transmission mechanism is a key infrastructure of immersion lithography equipment, which is used to execute the liquid dispensation and recovery, and ensures no leakage or bubbles.
提出了针对大视场投影光刻物镜畸变的计算方法，并在完成的畸变特性测量装置上进行了8英寸的硅片测量。
The calculative method of the large field projection lithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed.
第四章介绍了激光LIGA光刻实验装置的总体设计以及各单元部件的研制情况。
In chapter four, the system design of Laser LIGA Lithography Apparatus and unit design are introduced.
灯保护罩，含灯和保护罩的装置，光刻器械中安装光源的方法。
Protective cover for a lamp, set including a lamp and a protective cover, method of installing a source in a lithographic apparatus.
灯保护罩，含灯和保护罩的装置，光刻器械中安装光源的方法。
Protective cover for a lamp, set including a lamp and a protective cover, method of installing a source in a lithographic apparatus.
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