The design and fabrication of high aspect-ratio hard X-ray zone plates by X-ray lithography are studied.
对利用X射线光刻制作大高宽比硬x射线波带片的设计和制作工艺进行了研究。
In synchrotron radiation X-Ray lithography, distortion of mask is caused by its initial tension, stress and inhomogeneous thermal effect.
在同步辐射X射线光刻中，由于掩模的初始张应力和掩膜的非均匀受热将使掩模产生热畸变。
The manufacture of high-line-density X-ray transmission gratings for X-ray spectroscopy by using electron beam lithography and X-ray lithography was reported.
针对X射线透射光栅摄谱仪中的高线密度光栅，研究了采用电子束曝光和X射线曝光技术结合制作高线密度X射线透射光栅的工艺技术。
The image edge-enhanced technique was proposed to improve the automatic aligning efficiency and aligning accuracy in the X-ray lithography aligning system, and the numerical analysis was given.
提出了用于提高X射线光刻对准系统自动对准效率和对准精度的图像边缘增强技术，并进行了数值分析。
The fabrication procedure of the mask and results of the deep X ray lithography are given.
给出了该掩模设计制作工艺过程及深x射线光刻结果。
Using high - power pulsed laser - produced plasma as soft X - ray source for approach lithography is described in this paper.
描述了用高功率脉冲激光打靶产生的等离子体作为软x射线源而进行的接近式软x射线光刻研究。
The fabrication of X-ray stencil silicon mask and its application in X-ray deep lithography are presented in this paper.
阐述了X射线镂空硅掩模的研制及其在同步辐射深层光刻中的应用。
This article mainly explains the process of LIGA technology, which includes X-ray mask lithography, Micro-electroforming and Micro-copy.
本文主要阐述了LIGA技术的工艺过程，包括X射线深层光刻、微电铸和微复制工艺。
This article mainly explains the process of LIGA technology, which includes X-ray mask lithography, Micro-electroforming and Micro-copy.
本文主要阐述了LIGA技术的工艺过程，包括X射线深层光刻、微电铸和微复制工艺。
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