It utilizes optical phase shifting mask to improve resolution limit for an existing wafer stepper.
它应用了光学相移掩模方法，大大提高了现有光学光刻设备的分辨率水平。
It provides more convenient research means for understand the physical essence of diffraction between mask and wafer of proximity deep stepper.
对深入理解和认识接近式深度光刻机的掩模-硅片间衍射的物理本质提供了更为方便的研究手段。
It provides more convenient research means for understand the physical essence of diffraction between mask and wafer of proximity deep stepper.
对深入理解和认识接近式深度光刻机的掩模-硅片间衍射的物理本质提供了更为方便的研究手段。
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