Motion control system of an ultra precision wafer stage with application to integrated circuit production was presented.
描述一种应用于集成电路制造的超精密硅片台系统及其运动控制。
A novel in-situ non-flatness measurement method of wafer stage mirrors in a step-and scan lithographic tool is presented.
提出一种新的步进扫描投影光刻机工件台方镜不平度测量方法。
The air foot, wafer supporting stage system, the design and calculating methods of STAMP are discussed, the design data and calculating results are given.
讨论了气足、承片台系统及STAMP的设计和计算方法，并给出了设计数据与计算结果。
The air foot, wafer supporting stage system, the design and calculating methods of STAMP are discussed, the design data and calculating results are given.
讨论了气足、承片台系统及STAMP的设计和计算方法，并给出了设计数据与计算结果。
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