Taking advantage of synchronization compensator, position compensation is fulfilled by using the fine reticle stage to compensate the deviation between position of the wafer stage and wafer stage.
设计了同步补偿器,利用掩模台微动台运动实时补偿掩模台与硅片台间的位置同步误差。
参考来源 - 极紫外光刻机工件台精密机械及控制相关技术·2,447,543篇论文数据，部分数据来源于NoteExpress
Motion control system of an ultra precision wafer stage with application to integrated circuit production was presented.
描述一种应用于集成电路制造的超精密硅片台系统及其运动控制。
A novel in-situ non-flatness measurement method of wafer stage mirrors in a step-and scan lithographic tool is presented.
提出一种新的步进扫描投影光刻机工件台方镜不平度测量方法。
The air foot, wafer supporting stage system, the design and calculating methods of STAMP are discussed, the design data and calculating results are given.
讨论了气足、承片台系统及STAMP的设计和计算方法，并给出了设计数据与计算结果。
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