Correct selection of source gases and their compositions is one of the critical factors for si trench etching.

源气体及组分的选择是硅槽刻蚀技术的关键因素。

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Correct selection of source gases and their compositions is one of the critical factors for si trench etching.

源气体及组分的选择是硅槽刻蚀技术的关键因素。

youdao