Then, the influence of deep-submicron technology on IDDQ testing is explained. And the improved IDDQ testing methods are also given.
分析了深亚微米技术对IDDQ测试的影响以及IDDQ的改进方法。
The deep submicron technology presents lots of new challenges to the physical design of VLSI and new techniques are needed in the back-end design flow.
深亚微米下芯片的物理设计面临很多挑战，特别是对于超大规模电路，在后端设计流程上要有新的方法。
The research result of this paper has some directive meaning and applicable value in physical design and optimization for VLSI under deep-submicron technology.
本文的研究结果对于深亚微米工艺下的大规模物理设计与优化，具有一定的指导意义和应用价值。
This paper introduces a novel submicron etching technology for emitter window.
介绍了一种新的亚微米发射极窗口刻蚀工艺。
Triple resist technology which can pattern submicron patterns has been developed and used to fabricate submicron IC's successfully depending upon the native lithography equipment.
在现有国产光刻设备的基础上，研制成功了能够复印出亚微米图形的三层胶工艺，并用于制作亚微米电路。
Optical rotation technology has been used in many fields as manipulating a single micron, submicron particles, and has broad prospects for development.
光致旋转技术已经在很多领域被用来作为操纵单个微米、亚微米级微粒，具有广阔的发展前景。
Now, the present ion implantation technology, especially ion implantation equipment and systems, can not meet the needs in the manufacturing of deep submicron devices and circuits.
就目前而言，已有的离子注入技术(包括离子注入设备系统)尚不能满足甚亚微米器件和电路制造的需要。
The latest advance of the dry etching for submicron fabrication in ULSI production and interrelated technology are introduced.
综述了亚微米、深亚微米干法刻蚀和相关技术的最新进展及其在超大规模集成电路制造中的应用。
Though it can solve many problems during RF analog IC design in deep submicron meter technology, but it still can't i(?)place all conventional analog circuit component or structure.
模拟电路数字化虽可解决很多深亚微米工艺射频模拟集成电路设计中出现的问题，但暂时依然无法完全替代传统模拟电路器件和结构。
Though it can solve many problems during RF analog IC design in deep submicron meter technology, but it still can't i(?)place all conventional analog circuit component or structure.
模拟电路数字化虽可解决很多深亚微米工艺射频模拟集成电路设计中出现的问题，但暂时依然无法完全替代传统模拟电路器件和结构。
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