Its approach is to deposit the CIGS layer using a sputtering process borrowed from the disk-storage industry.
它的方法是通过借鉴于碟片储存行业的“喷溅”处理来沉积CIGS层面。
The results show that the sputtering process factors have large effect on the compositions and magnetic properties.
结果表明，溅射工艺因素对薄膜的成份和磁性能有较大的影响。
However, it is still a question how to determine sputtering process parameters, microstructure and properties of thin films.
然而溅射工艺参数的选取以及沉积的薄膜结构和性能是人们主要关注的课题。
The paper has outlined the dispersion technology, sticking method and sputtering process for powder specimen studied by using SEM.
阐述了用扫描电镜研究粉末试样的分散技术、固定方法和镀膜技术。
Magnetron sputtering process has widely been applied to thin film preparation, during which, the quality of thin film is affected badly by the current stability of target.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
Magnetron sputtering process has widely been applied to thin film preparation, during which, the quality of thin film is affected badly by the current stability of target.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
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