The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
The influence of negative pulse voltage applied directly to stainless steel samples on plasma characteristics has been found to be negligible, except sample sputtering.
直接施加于试样的脉冲负偏压对等离子体特性没有明显影响，但存在着一定的溅射作用。
Mercury used as a cathode sputtering inhibitor in DC plasma displays with a content up to 30 mg per display until 1 July 2010.
毫克每显示的直流等离子显示器中阴极溅射抑制剂中的汞含量。
Quadrupole mass spectrometer was used to analyze the plasma environment of RF magnetron sputtering PTFE target with pulsed bias.
采用四极质谱仪测量了试验参数对高压脉冲增强射频磁控溅射ptfe靶等离子体气氛的影响规律。
The plasma can be 4 generated by hot-cathode discharge or RF discharge of gas. In addition, the device has four metal plasma sources, two magnetron sputtering targets, cold and hot target supports.
真空室内的气体等离子体可由热灯丝或射频放电产生，4另外还配置了4个金属等离子体源、两套磁控溅射靶和冷却靶台。
The application and features of vaccum strip coating processes such a thermal jet evaporation, magnetron sputtering, electron-beam evaporation and plasma enhanced EB evaporation process were reviewed.
介绍了新一代连续带钢镀膜技术-真空镀膜的工艺特点及应用现状。
Plasma Nitriding Plasma can accelerate the reactions by increasing the energy of nitrogen ions and additionally activating them as a result of cathode sputtering.
血浆氮化物血浆能借由增加能源加速反响氮离子而且此外启动他们结果阴极溅散。
Plasma Nitriding Plasma can accelerate the reactions by increasing the energy of nitrogen ions and additionally activating them as a result of cathode sputtering.
血浆氮化物血浆能借由增加能源加速反响氮离子而且此外启动他们结果阴极溅散。
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