Nanoimprint lithography becomes a hot focus of novel lithography technologies of next generation due to its advantages of low cost, high yield and fidelity of large area pattern transfer.
纳米压印光刻技术具有效率高、失真率低、易于实现大面积图形转移等特点，成为下一代光刻技术的研究热点。
A novel optical communication scheme of 2D pattern transfer model based on multi-beam array in complex channel is proposed.
提出了一种利用多光束阵列在复杂散射信道中进行二维图案传输的理论模型。
By pressing, nano-imprinting lithography technology to complete the pattern transfer of nano-structure is characterized by high resolution, high efficiency and low cost.
纳米压印技术通过压印实现了纳米结构的图形转移，具有分辨率高、效率高、成本低的优点。
The specific parameters of main optical system are deduced from the requirement of pattern transfer for the projection aligner. The limit of these parameters is discussed.
本文从投影光刻机的图形传递要求出发，导出投影光刻机各主要光学系统的具体要求，并讨论这些参数确定的局限性。
Interlingual error refers to the error due to transferring rules from mother tongue, including linguistic transfer, cultural transfer, and thought pattern transfer.
其中语际错误相对显著，语际错误主要由母语的负迁移(包括语言迁移，文化迁移和思维模式迁移)所造成。
Pattern transfer technique is used to transfer photoresist microlens arrays into the polymer underlayer.
通过反应离子刻蚀可以将光刻胶微透镜图形转移至这种高性能的聚合物材料上。
Pattern transfer technique is used to transfer photoresist microlens arrays into the polymer underlayer.
通过反应离子刻蚀可以将光刻胶微透镜图形转移至这种高性能的聚合物材料上。
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