This system is applied to the measurement of microwave ECR plasma inner parameters and proved to work well.
将该系统应用于微波ecr等离子体参数的测定，经实验测试效果较好。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
Combining the optical diagnostics and composition detection of the plasmas, the mechanism of the ECR plasma treatment was discussed.
结合等离子体光学诊断和成分探测，分析讨论了ECR等离子处理机理。
The measuring method and results of the ECR plasma properties taken from hard X-ray pinhole camera on the MM-2 magnetic mirror are presented.
介绍了用硬x射线的针孔成像法测量简单磁镜装置MM - 2中ecr等离子体特性的方法及结果。
The etching of CVD diamond thick films was accomplished by the ECR plasma under optimized pressure conditions and the etching mechanism is studied.
利用该等离子体在优化的气压条件下对化学气相沉积金刚石膜进行了刻蚀， 并研究了刻蚀机理。
The hard X - ray pinhole imaging method and its application in a simple mirror for measuring the radiation properties of ECR plasma are presented in this paper.
本文描述用硬x射线针孔成象法测量简单磁镜装置中ecr等离子体辐射特性的方法及其结果。
A compact ECR plasma source, the strengths of which are its ultra low electron temperature, its low pressure and its ultra low density, was developed and built for such a simulator.
本文就是为空间电离层环境模拟器研制的扩散型极低气压、低电子温度和极低密度的紧凑型电子回旋共振等离子体源的研制。
This article reviews the basic physics of ECR discharge and experimental research, and describes new applications of ECR plasma in surface processing, plasma coating and ion source.
本文综述了ECR放电的基本物理过程和实验研究概况，介绍了ECR等离子体在表面处理、镀膜和离子源等方面应用的最新结果。
Principles of microwave ECR plasma technology are introduced briefly. Present development of it'S research and applications in system manufacturing, CVD, PVD and etching is reviewed.
本文简要介绍了微波ECR等离子体技术的原理，评述了近年来这种技术在CVD、PVD、刻蚀等方面的研究和应用的进展。
The characterization of the plasma impedance provides a new diagnostic method for the study of the mechanism of ECR plasma, and is useful to the application of ECR plasma technology.
阻抗特性分析为ECR等离子体的机理研究提供了一种新的诊断途径，有利于ECR等离子体工艺的推广和应用。
The cleaning of hydrogen and nitrogen ECR plasma on sapphire substrates are carried out in the calibrated temperature system and evaluated by analyzing RHEED image in ECR-PEMOCVD system.
最后讨论了在经过校温的系统上进行蓝宝石衬底的氢氮等离子体清洗实验，并通过RHEED图像评价清洗结果质量。
The microwave electron cyclotron resonance (ECR) plasma is one of the most important means for depositing thin films and microfabrications as well as surface modifications of materials.
微波电子回旋共振等离子体是淀积薄膜、微细加工和材料表面改性的一种重要手段。
The distribution of radicals in CHF3/C6H6 electron cyclotron resonance (ECR) plasma was investigated by an actinometric optical emission spectroscopy (AOES).
使用光强标定的发射光谱（AOES）测量了CHF3/C6H6混合气体的微波电子回旋共振（ECR）放电等离子体中基团的分布状态。
Yak hairs were treated by the microwave electron cy cl otron resonance plasma reactive ion etching(ECR-RIE) equipment to improve its property of weave.
采用微波电子回旋共振等离子体反应离子刻蚀（E CR-R IE）装置对牦牛毛纤维进行表面改性，从而改善牦牛毛的可纺性。
Smoothing, dense and uniform nano crystalline diamond like carbon films are prepared by using electron cyclotron resonance (ECR) microwave acetone plasma chemical vapor deposition (CVD) method.
利用电子回旋共振（ECR）微波等离子体辅助化学气相沉积技术、工作气氛为丙酮，在光学玻璃衬底上得到了光滑、致密、均匀的类金刚石薄膜。
Smoothing, dense and uniform nano crystalline diamond like carbon films are prepared by using electron cyclotron resonance (ECR) microwave acetone plasma chemical vapor deposition (CVD) method.
利用电子回旋共振（ECR）微波等离子体辅助化学气相沉积技术、工作气氛为丙酮，在光学玻璃衬底上得到了光滑、致密、均匀的类金刚石薄膜。
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