This system is applied to the measurement of microwave ECR plasma inner parameters and proved to work well.
将该系统应用于微波ecr等离子体参数的测定，经实验测试效果较好。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
Combining the optical diagnostics and composition detection of the plasmas, the mechanism of the ECR plasma treatment was discussed.
结合等离子体光学诊断和成分探测，分析讨论了ECR等离子处理机理。
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