High aspect ratio structures have been successfully fabricated by plasma cryo-etching on silicon wafers.

等离子体低温刻蚀是一种针对高深宽比结构的干法刻蚀技术。

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High aspect ratio structures have been successfully fabricated by plasma cryo-etching on silicon wafers.

等离子体低温刻蚀是一种针对高深宽比结构的干法刻蚀技术。

youdao