Script 7.pl matches Unicode characters in regular expressions (7_out.txt shows a sample run of 7.pl).
脚本 Script7.pl 就可以匹配正则表达式中的Unicode字符（7_out.txt 给出了运行 7.pl 的样例输出）。
Thus, script 4.pl gave me the error "Can't find string terminator \343 anywhere before EOF at ./4.pl line 7." (in which \343 was an unrelated character).
因此，script 4.pl 会报告一个错误“Can'tfindstringterminator \343anywherebeforeEOFat ./4.plline7.” （其中 \343是一个无关字符）。
These both embody a set of PL/SQL statements and attach a name to that set, allowing the logic to be easily referenced by other PL/SQL and SQL code.
它们都是包含一组PL/SQL语句，并为这组语句关联一个名称，以便其他 PL/SQL和 SQL代码引用其中的逻辑。
Previous to DB2 9.7, they only supported inline SQL PL, which is a small subset of SQL PL.
在DB2 9.7之前，它们仅支持内联SQLPL，这只是 SQL PL的一个小子集。
The difference between PL spectra of TMEP solution and PL spectra of TMEP solid film confirms the formation of excimer.
激基缔合物的形成从TMEP在薄膜状态下与溶液状态下的荧光光谱的比较中得到证实。
The difference between PL spectra of TMEP solution and PL spectra of TMEP solid film confirmed the formation of excimer.
激基缔合物的形成从TMEP在薄膜状态下与溶液状态下的荧光光谱的比较中得到证实。
The blue shift of the PL peak is a result of oxidation of inner surfaces of PS and the decrease of PL efficiency is attributed to the produce of nonradiative recombination centers during oxidation.
我们认为很可能是多孔硅内表面的氧化作用使光致发光峰位蓝移，由氧化作用产生的非辐射复合中心导致光致发光效率的下降。
The PL/M86 software dynamic test system is an important automatic test tool in development of PL/M86 software.
M86程序动态测试系统是对PL/M86软件进行动态测试所用的自动测试工具。
The ratio of the UV PL intensity to the visible PL intensity is 54, indicating the high quality of ZnO quantum dot was acquired.
光致发光谱中紫外发射峰积分强度和可见发射峰的积分强度比达到54，表明得到了较高质量的氧化锌量子点。
PL ra 1443 has excellent adhesive, covering, buffed and embossing properties. It can improve the grade and smoothness when PL ra 1443 is used for low grade leather.
PLRA 1443有优良的粘着力、磨革性及压花定型性，可遮盖皮面各种轻重伤残，提高皮面等级率及平滑度。
In addition, the PL intensity is monotonically increasing with the blue shift of PL wavelength due to the increasing density of small-size Si-ncs.
此外，由于小颗粒纳米硅的密度增加，光激发荧光强度会随着光激发荧光波长的蓝移而递增。
Meanwhile, the trend of porosity and PL spectrum with changing etching time confirm that it is necessary for improving PL intensity to increase porosity.
同时，孔隙率和光致发光谱随腐蚀时间的变化趋势证实了提高孔隙率是提高多孔硅发光强度的必要条件。
Meanwhile, the trend of porosity and PL spectrum with changing etching time confirm that it is necessary for improving PL intensity to increase porosity.
同时，孔隙率和光致发光谱随腐蚀时间的变化趋势证实了提高孔隙率是提高多孔硅发光强度的必要条件。
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