• Ability to hide the substrate at a given film thickness.

    一定厚度遮盖住基材的能力。

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  • Set up the substrate well, this is the main part of the non CO2 tank.

    底床一定要设置好,这对于无CO2添加的缸来说至关重要。

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  • At least one trench extends through the body region and the substrate.

    至少有一条凹槽延伸穿过体区和衬底。

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  • The gate is disposed on the substrate and straddled the fin structure.

    栅极设置于基底衬底上,横跨鳍状结构。

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  • At this time, the position where the substrate is cleaned is corrected.

    此时,修正基板的清洗位置。

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  • The first gate and the second gate are separately disposed on the substrate.

    第一栅极及第二栅极分开配置于所述基底上。

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  • Besides, contact poling can provide poling size as large as the substrate size.

    直接接触极化方式极化的面积能够达到基板的尺寸。

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  • The method then fabricates a metal support structure in place of the substrate.

    该方法然后制造金属支承结构代替衬底。

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  • Foreign matter on a part of the substrate to be cleaned in a pre-treatment system.

    在预处理系统被清洗的工件上的杂质。

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  • The substrate is first covered by a mask .

    首先在基片上覆盖一个掩膜片。

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  • The substrate is placed into a process chamber.

    基板置于处理腔内。

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  • The substrate must be dry, solid, and free from dust.

    墙面基层必需干燥、牢固、无尘埃。

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  • The substrate type ISFET is a chemically sensitive device.

    衬底型ISFET是一种化学敏感器件。

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  • The substrate packing device comprises a box body and a separation unit.

    此基板包装装置包括箱体与分隔单元。

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  • The substrate packing device comprises a box body and a separation unit.

    此基板包装装置包括箱体与分隔单元。

    youdao

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