The parameters deciding the quality in polishing process are as follows: slurry, temperature, wafering time, and so on.

抛光过程中决定抛光质量的参数有：抛光浆体、抛光温度、抛光时间等。

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Thirdly, the parameters deciding the quality in polishing process are as follows: slurry, polish pad, pressure, temperature, rotation speed, wafering time, and so on.

在抛光工艺中，抛光液的种类、抛光垫的选择、抛光压力、温度、抛光盘转速、加工时间等诸多条件都是决定抛光质量的重要因素。

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Thirdly, the parameters deciding the quality in polishing process are as follows: slurry, polish pad, pressure, temperature, rotation speed, wafering time, and so on.

在抛光工艺中，抛光液的种类、抛光垫的选择、抛光压力、温度、抛光盘转速、加工时间等诸多条件都是决定抛光质量的重要因素。

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