The utility model relates to a semi-circular column magnetic control sputtering cathode, belonging to a sputtering source component of a magnetron sputtering device.
一种半圆柱磁控溅射阴极，属于磁控溅射装置中的溅射源部件。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
The design of a DC sputtering power source was presented.
介绍一种大功率直流溅射恒流电源的设计。
The source material for a sputtering process.
溅射工艺用源材料。
In ion-beam sputtering deposition and ion-beam aid deposition thin film techniques, ion-beam source is one of the key techniques.
在离子束溅射和离子辅助沉积光学薄膜技术中，离子源是其中最关键的单元技术之一。
In ion-beam sputtering deposition and ion-beam aid deposition thin film techniques, ion-beam source is one of the key techniques.
在离子束溅射和离子辅助沉积光学薄膜技术中，离子源是其中最关键的单元技术之一。
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