The chemical is widely used in the production of LSI, VLSI and other semiconductors to remove photoresist edge bead that occurs during typical spin coat wafer processing.
该试剂用于清除匀胶后残留于硅片边缘及背面的光刻胶，已经广泛应用于中、大规模集成电路及其它半导体器件的生产。
One spin around the socket while donning the coat and the girl advertises her resistance while doing as she intended all along.
穿上外套，但眼珠子在眼窝里转上一圈；仍做她本来就想做的事，但用这样的方式去表达她的反抗。
One spin around the socket while donning the coat and the girl advertises her resistance while doing as she intended all along.
穿上外套，但眼珠子在眼窝里转上一圈；仍做她本来就想做的事，但用这样的方式去表达她的反抗。
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