The invention relates to a polyhedral silsesquioxane (POSS)-modified polypropylene melt-blown nonwoven fabric and a preparation method thereof.
本发明涉及一种多面体倍半硅氧烷(POSS)改性聚丙烯熔喷非织造布及其制备方法。
Disclosed herein is a method for forming an interlayer dielectric film for a semiconductor device by using a polyhedral molecular silsesquioxane.
此处公开了一种使用多面体分子倍半硅氧烷形成半导体器件所用的层间电介质膜的方法。
Disclosed herein is a method for forming an interlayer dielectric film for a semiconductor device by using a polyhedral molecular silsesquioxane.
此处公开了一种使用多面体分子倍半硅氧烷形成半导体器件所用的层间电介质膜的方法。
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