It utilizes optical phase shifting mask to improve resolution limit for an existing wafer stepper.
它应用了光学相移掩模方法，大大提高了现有光学光刻设备的分辨率水平。
The principle, making method, technology and procedure for the rim phase shifting mask are described. Some experimental results are given.
论述了边缘相移掩模的原理、制作方法和工艺步骤，并给出了一些实验结果。
The principle, making method, technology and procedure for the rim phase shifting mask are described. Some experimental results are given.
论述了边缘相移掩模的原理、制作方法和工艺步骤，并给出了一些实验结果。
应用推荐