Handbook of Micro lithography, Micromachining, and Micro fabrication. Vol.1: microlithography.
微平版印术，显微机械加工，和微制作手册：卷一：微平版印术。
As a newly coming micro fabrication technology, soft lithography use elastomeric stamp to replace hard stamp in traditional lithography to fabricate micro patterns and structures.
作为一种新型的微图形复制技术，软光刻技术用弹性模替代传统光刻技术中使用的硬模来产生微形状和微结构。
Some industrial applications including micromachining dynodes of photomultipliers, repairing photomask of lithography, fabricating array micro-holes in incandescent filaments, etc. are introduced.
介绍了飞秒激光加工光电倍增管电极，修复光刻掩膜，诱导白炽灯丝阵列微孔等一些工业应用。
A method of photo-mask lithography for fabrication of micro Fresnel lenses Arraywas presented in this paper.
本文介绍用制版的方法制作的微菲涅耳透镜列阵及其成像实验。
The method and the principle of manufacturing micro-machines by sacrificing layer technology together with 3-d lithography is discussed also.
同时还介绍了立体光刻技术结合抗腐蚀层、牺牲层工艺加工微器件的原理、方法和应用。
A process of soft lithography was introduced for fabrication of PDMS (polydimethylsiloxane) micro-mixer on micro-fluidic chip.
介绍了一种用软光刻技术制作微流芯片上PDMS微混合器的工艺。
We study the factors which affect electron-beam micro lithography, combining with our practical work.
结合实际工作，分析、探讨了影响电子束曝光机加工微细化的因素。
This article mainly explains the process of LIGA technology, which includes X-ray mask lithography, Micro-electroforming and Micro-copy.
本文主要阐述了LIGA技术的工艺过程，包括X射线深层光刻、微电铸和微复制工艺。
Laser lithography is one of the main methods for manufacturing micro-optical and the binary optical masks.
激光光刻是加工微光学及二元光学掩模的主要手段。
An once exposition micro stereo-lithography prototyping device with higher machining resolution and can be used for directly prototyping 3d complex microstructure is introduced in this paper.
介绍了一种具有更高加工分辨率且可直接成形三维复杂微型器件的一次曝光型微立体光刻成形装置。
The smallest linewidth produced by laser lithography plays an important role in the properties of the micro-optical elements.
光刻的最细线宽对所加工的二元微器件性能起决定作用。
A micron-precision optical alignment system is developed for three-dimensional Micro Electro-Mechanical System(MEMS) device fabrication based on multi-layer imprint lithography.
针对基于微压印成形三维MEMS器件制造工艺多层压印的需要，开发了一套基于视频图像对正原理的压印光刻对准系统。
A micron-precision optical alignment system is developed for three-dimensional Micro Electro-Mechanical System(MEMS) device fabrication based on multi-layer imprint lithography.
针对基于微压印成形三维MEMS器件制造工艺多层压印的需要，开发了一套基于视频图像对正原理的压印光刻对准系统。
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