Advance a series of parameters to support mask making, process, package and test.
提出工程中要求的一系列参数支持制版、流片、封装和验证。
Electron beam lithography machine is the key instrument for mask making and research of nanometer device.
电子束曝光技术是掩模版制作和纳米器件研究的主要手段。
Mask making with one step exposure and device making with multiple overlay exposure are applications of the system.
激光直写系统的应用，可以分成一次曝光制作光刻掩模和多次套刻曝光制作器件两个方面。
Single step mask fabrication process is developed for LIGA technology, which made mask-making process simplified.
在LIGA技术研究中提出了一次掩膜成型法，简化了工艺过程；
Single step mask fabrication process is developed for LIGA technology, which made mask-making process simplified.
在LIGA技术研究中提出了一次掩膜成型法，简化了工艺过程；
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