• Then, a micro exhaust duct was etched on an electroforming deposit through mask etching technology.

    然后利用掩膜腐蚀方法在铸层上腐蚀出微排气通道。

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  • Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.

    提出了优化实验参数、增加束掩模和利用刻蚀技术三种改善原子光刻实验的方法。

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  • Photoresist grating was fabricated by holography, and it was used in the mask of ion etching.

    采用全息法制备了光刻胶光栅,并用该光栅掩膜离子蚀刻。

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  • The mask design and the wet etching are both key processes in the technology introduced.

    在整套工艺环节中,光掩模版图设计和湿法腐蚀是两个关键步骤。

    youdao

  • The mask design and the wet etching are both key processes in the technology introduced.

    在整套工艺环节中,光掩模版图设计和湿法腐蚀是两个关键步骤。

    youdao

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