The mask design and the wet etching are both key processes in the technology introduced.

在整套工艺环节中，光掩模版图设计和湿法腐蚀是两个关键步骤。

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The mask design and the wet etching are both key processes in the technology introduced.

在整套工艺环节中，光掩模版图设计和湿法腐蚀是两个关键步骤。

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