The arts include calligraphy and lithography.
平面造型艺术包括书法和平版印刷术。
Nikon is also reversing its losses in lithography.
另外，尼康光刻机业务也开始扭亏为盈。
The graphic arts include calligraphy and lithography.
平面造型艺术包括书法和平版印刷术。
All these make a great improvement to quantum lithography.
因而是对量子光刻术的一个很大改进。
The sensor is fabricated by traditional lithography and etching.
制作采用的是传统的光刻、刻蚀工艺。
Lithography % - The process used to transfer patterns onto wafers.
光刻-从掩膜到圆片转移的过程。
The electron beam lithography and its improvement are introduced also.
同时还介绍了电子束光刻技术及其改进。
It may provide a strong quantum lithography with a moderate visibility in p.
因此，在实际应用中，它可以提供具有合适可见度的强光量子光刻术。
In this article, deep submicron lithography and nano processing are reviewed.
本文综述了深亚微米光刻和纳米光刻技术。
The new set of models are more proper for lithography simulation for thick SU-8 resist.
对于厚su - 8胶的模拟，这种模型比普通的模拟模型更加合适。
Electron - beam lithography with a novel multilevel resist structure defines the pattern.
采用新型的多层抗蚀剂结构的电子束光刻来形成图形。
Handbook of Micro lithography, Micromachining, and Micro fabrication. Vol.1: microlithography.
微平版印术，显微机械加工，和微制作手册：卷一：微平版印术。
The PMMA mold with a microstructure was fabricated using synchronous radiation lithography.
首先利用同步辐射曝光，制作出带有微结构的PMMA模具。
Therefore, the technology of EUVL is becoming a hot point in international lithography field.
因而，该技术也是目前国际上先进光刻领域研究的热点。
Durable, white, water - resistant, low shrinkage resin for stereo lithography for SLA system.
应用于立体光刻技术的耐久性，白色，防水和低收缩的树脂。
We study the factors which affect electron-beam micro lithography, combining with our practical work.
结合实际工作，分析、探讨了影响电子束曝光机加工微细化的因素。
In chapter four, the system design of Laser LIGA Lithography Apparatus and unit design are introduced.
第四章介绍了激光LIGA光刻实验装置的总体设计以及各单元部件的研制情况。
The lithography and the manufacture technology are the lithograph most important art performance method.
石版印刷和制作技术是石版画最重要的艺术表现手段。
The lithography systems maker also said it sees strong and continuous structural demand” for its products.
阿斯麦公司还表示，旗下产品的需求会出现持续的强势增长。
Electron beam lithography machine is the key instrument for mask making and research of nanometer device.
电子束曝光技术是掩模版制作和纳米器件研究的主要手段。
A method of photo-mask lithography for fabrication of micro Fresnel lenses Arraywas presented in this paper.
本文介绍用制版的方法制作的微菲涅耳透镜列阵及其成像实验。
The optical lithography correction techniques become key technologies in the IC designing and manufacturing of VDSM.
光刻校正技术已成为超深亚微米下集成电路设计和制造中关键的技术。
Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).
掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
Inductors were defined by electron-beam lithography and formed by depositing micron-thick aluminium metal onto the wafers.
用电子束刻蚀法在晶片上镀上纳米级铝层形成了电感器。
The principle and control algorithm of temperature compensation for Sub Micron projection lithography objectives are introduced.
主要介绍一种光刻机投影物镜温度补偿控制的原理及控制算法。
Next, a mixture of two polymers is added to the metal substrate to create patterns, a process known as diblock copolymer lithography (BCP).
接下来，在金属基板上添加一种由两种聚合物组成的混合物来制作样品，这个工艺过程被称为嵌段共聚物光刻(BCP)。
E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.
因此目前电子束光刻设备主要的用途是用于刻制掩膜板，许多人甚至认为电子束光刻技术的产出量永远也无法满足芯片量产的需求。
They then defined the transistor channel using electron-beam lithography, removing graphene outside of channel regions with an oxygen plasma.
然后在氧等离子体中用电子束刻蚀法去除沟道区石墨烯形成晶体管的沟道。
It will also use copper interconnects, low-k, strain silicon and other features. Like 32-nm, Intel will make use of 193-nm immersion lithography.
这款产品将使用Intel第三代HKMG工艺，第五代硅应变技术，另外与32nm类似，22nm制程仍将继续使用193nm液浸式光刻技术。
The process of SU-8 photoresist lithography is researched, and the influence of steps like coating and soft-bake on the lithography is studied.
初步研究了SU-8胶的光刻工艺流程，讨论了涂胶、前烘等各个步骤对光刻结果的影响。
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