• The aggressiveness ofaerated solution accreted by increasing the limit diffusion current density of oxygen.

    介质充气后氧的极限扩散电流密度增大,材料的侵蚀性增强。

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  • Then, the concentration under different wind diffusion condition are analysized by using ground pollution mode so that the ratio of contribution to the total pollution limit is obtained.

    之后采用近地面尘降模型,计算了污染源不同气象层结下扩散状况得出污染浓度大气环保浓度的分担

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  • By analyzing the spread function and development contrast curve, we hypothesized that the resolution limit of electron-beam lithography is primarily limited by developer-diffusion.

    通过电子束扩散函数显影对比度分析,本文认为电子束曝光分辨极限与显影液纳米尺度下的扩散限制有关。

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  • By analyzing the spread function and development contrast curve, we hypothesized that the resolution limit of electron-beam lithography is primarily limited by developer-diffusion.

    通过电子束扩散函数显影对比度分析,本文认为电子束曝光分辨极限与显影液纳米尺度下的扩散限制有关。

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