The aggressiveness ofaerated solution accreted by increasing the limit diffusion current density of oxygen.

介质充气后氧的极限扩散电流密度增大，对材料的侵蚀性增强。

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Then, the concentration under different wind diffusion condition are analysized by using ground pollution mode so that the ratio of contribution to the total pollution limit is obtained.

之后采用近地面尘降模型，计算了这类污染源在不同气象层结下的扩散状况，得出其污染浓度对大气环保浓度的分担率。

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By analyzing the spread function and development contrast curve, we hypothesized that the resolution limit of electron-beam lithography is primarily limited by developer-diffusion.

通过对电子束扩散函数与显影对比度的分析，本文认为电子束曝光的分辨极限与显影液在纳米尺度下的扩散限制有关。

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