The aggressiveness ofaerated solution accreted by increasing the limit diffusion current density of oxygen.
介质充气后氧的极限扩散电流密度增大，对材料的侵蚀性增强。
By analyzing the spread function and development contrast curve, we hypothesized that the resolution limit of electron-beam lithography is primarily limited by developer-diffusion.
通过对电子束扩散函数与显影对比度的分析，本文认为电子束曝光的分辨极限与显影液在纳米尺度下的扩散限制有关。
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