The fabrication methods of MPC include electron beam lithography with subsequent evaporation and lift-off, interference lithography with dry-etching technology etc.
制备金属光子晶体方法包括：电子束刻蚀结合后续剥离法、激光干涉光刻结合干刻蚀技术等。
The lithography room is lit with yellow light to avoid interference with the UV light used with the photomasks.
平板印刷室里面点着黄色的灯，避免光掩膜与紫外线相互干扰。
The lithography room is lit with yellow light to avoid interference with the UV light used with the photomasks.
平板印刷室里面点着黄色的灯，避免光掩膜与紫外线相互干扰。
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