A new method for measuring sheet resistance of semiconductor using four-point probe has been developed.
本文介绍用四探针技术测量半导体薄层电阻的新方案。
A measurement of resistivity of metal film using four-point probe technique can be used as the general physics experiment.
四探针测量金属薄膜电阻率是当今微电子技术领域中常用的方法。
Figure 4-47 is a diagram of four - point collinear probe setup for resistivity measurements.
图4 -47是四点同线探针用于电阻率测量的配置图。
Figure 4-47 is a diagram of four-point collinear probe setup for resistivity measurements.
图4 -47是四点同线探针用于电阻率测量的配置图。
As with the four-point collinear probe method, a differential measurement may be required if the sample resistance is of the same magnitude as the isolation (meter common to ground) of the voltmeter.
与四点同线探针法一样，如果样品电阻和电压表的绝缘电阻（电压表的公共端到地）是同一数量级的，就可能需要使用差分测量。
The method to make four point probe instrument is provided.
并提供了自制四探针测量仪的方法。
The method to make four point probe instrument is provided.
并提供了自制四探针测量仪的方法。
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