A technique - filtered vacuum arc ion coating for thin film deposition-is reviewed in this paper.
介绍了一种新的镀膜技术—过滤式真空电弧离子镀膜技术。
This invention provides a film deposition device of simple structure that meets different growth requirements of films.
本发明提供一种满足根据不同薄膜的生长要求、构造简单的薄膜沉积装置。
DOE's fabrication techniques mainly include laser beam or electron beam writing, RIE, ion milling and thin film deposition.
衍射光学元件的制作技术主要包括激光或电子束直写、反应离子刻蚀、离子束铣及薄膜沉积。
A manufacturing method for a light splitting grating based on precision ruling and thin film deposition technologies was presented.
给出了采用光栅刻划和镀膜技术相结合研制光盘分束光栅的方法。
The reason why tungsten wire is easy to break in the silicon thin film deposition process by hot wire deposition method was explained.
揭示了常规热丝法薄膜淀积工艺中热钨丝易断裂的原因。
The spacial field during large area diamond film deposition was simulated using this model to study the influence of deposited parameters.
利用该模型对沉积大面积金刚石薄膜的空间场进行了模拟计算，研究了沉积参数对空间场的影响。
Its practical application in measurement of films formed by winding and continuous vacuum film deposition shows that this method is effective.
通过卷绕式连续真空镀膜膜厚测量的实例，证明效果良好。
The use of pulsed high energy density plasma is a new low temperature plasma technology for material surface treatment and thin film deposition.
脉冲高能量密度等离子体是一项全新的等离子体材料表面处理和薄膜制备技术。
The 16-step Fresnel lens had been fabricated by thin film deposition and ion beam etching and it has been used in refractive-diffractive CCD camera.
使用薄膜沉积法和离子束刻蚀法制作16阶菲涅耳透镜，应用于折衍混合CCD相机。
We have discovered that it is possible to tune the stress of a single-layer silicon nitride film by manipulating certain film deposition parameters.
我们已经发现，可以通过操作某些膜沉积参数来调节单层氮化硅膜的应力。
Plasma enhanced chemical vapor deposition (PECVD) is one of the matured and simple manipulated among the thin film deposition methods at low temperature.
等离子增强化学气相沉积(PECVD)是低温沉积硅膜的主要方法。
We use the thin film deposition to make 16 step fresnel lens, which can obtains lightweight system, miniaturization and increases free degree of the design.
使用薄膜沉积法制作1 6阶菲涅耳透镜，用它代替常规的光学透镜可实现系统的轻量化、小型化、增加系统设计的自由度。
The thin film deposition is used to make 16 step Fresnel lens . It can implement system′s lightweight, miniaturization and increase free degree of the design.
使用薄膜沉积法制作16阶菲涅耳透镜，用它代替常规的光学透镜可实现系统的轻量化、小型化，并增加系统设计的自由度。
And they have important reference for the quantitative research on the effect of various experimental conditions on diamond film deposition from EACVD technique.
同时，对于定量地研究各种实验条件对EACVD沉积金刚石的影响具有重要的参考价值。
A proprietary new thin-film deposition technology was used in the zirconia sensor that creates a molecular bond between the zirconia element and the platinum layer.
一个专有的新型薄膜沉积技术用于氧化锆传感器，在氧化锆元素和铂层之间创建一个分子键。
An in-situ optical monitoring system for thin film deposition is introduced. The components of the system, functions and working principles of each module are analyzed.
介绍了一种薄膜制造实时光学监控系统，对监控系统的组成及各个模块的功能和工作原理进行分析。
Based on the introduction of pulsed film deposition and vacuum arc technique, the principles, characters, research developments and applications of laser-arc technique are presented.
本文首先介绍了脉冲激光蒸发沉积以及真空弧沉积技术，在此基础上对激光真空弧技术的原理、特点、研究现状及应用进行了文献综述。
The common fabrication technologies of binary optical elements were expatiated, including etching, thin-film deposition, direct writing, excimer laser projection and gray-scale masks.
综述了二元光学元件的常用制作工艺技术，包括台阶刻蚀法、薄膜沉积法、直接写入法、准分子激光加工法和灰阶掩模法。
The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.
研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中，热阴极辉光放电特性与金刚石膜沉积工艺的关系。
In this paper, prevailing TBC deposition technologies, including plasma spray, electron beam-physical vapor deposition, ion beam assisted film deposition and chemical vapor deposition, are reviewed.
综述了热障涂层研究及应用中的几种主要制备技术，包括等离子喷涂、电子束物理气相沉积、离子束辅助沉积、化学气相沉积等。
However, it has the disadvantages in that the metal film formed on the polymer materials is not uniform and adhesion with the metal film and the reproducibility for metal film deposition are inferior.
但是，该方法是有缺点的，因为在聚合物材料上形成的金属膜不均匀，与金属膜的粘附以及金属膜沉积的重现性差。
A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
It has a fast deposition rate and surface cleaning features, in particular strong adhesion with the film, diffraction, and can be coated material widely and so on.
它具有沉积速度快和表面清洁的特点，特别具有膜层附着力强、绕射性好、可镀材料广泛等优点。
Ti-O film was prepared by microwave-electron convolute resonance (MW-ECR) magnetron filter arc deposition process.
采用微波电子回旋共振磁过滤弧设备制备钛氧薄膜。
When the peel agent formed by the deposition of that layer of film or when it completely clean, together with the sebum will peel off.
当剥下敷而剂所形成的那层薄膜或将之完全冲洗干净时，皮脂会随着一起剥落。
It is very effective in deposition many different types of film in small lot.
这是非常有效的沉积许多不同类型的电影在小很多。
Sculptured thin film grown by glancing Angle deposition technique is a new type of engineered columnar thin films with anisotropy.
倾斜沉积技术制备的雕塑薄膜是一种新型的、具有各向异性结构的薄膜材料。
It's discussed that constant temperatures of substrate are very important to the deposition of the diamond film.
文中所论述的恒定的基板温度对沉积金刚石薄膜是非常重要的。
It's discussed that constant temperatures of substrate are very important to the deposition of the diamond film.
文中所论述的恒定的基板温度对沉积金刚石薄膜是非常重要的。
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