Therefore, plasma etching anisotropy can be improved by increasing rf frequency or rf-bias power.
因此,等离子体刻蚀的各向异性可以通过增加射频频率和射频功率来改善。
This paper reported a silicon micromachined gyroscope that is driven by the rotating carrier's angular velocity. The silicon chip was manufactured by anisotropy etching.
报道了一种利用旋转体自身角速度作为驱动力,通过各向异性刻蚀硅片制作的硅微机械陀螺。
Finally, by researching the mechanism of the anisotropy etching, the fabricating procedure of MOEMS optical switch array is designed.
最后,研究了各向异性腐蚀的机理,设计了MOEMS光开关阵列芯片的制作工艺。
Finally, by researching the mechanism of the anisotropy etching, the fabricating procedure of MOEMS optical switch array is designed.
最后,研究了各向异性腐蚀的机理,设计了MOEMS光开关阵列芯片的制作工艺。
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