The elementary exposure pattern of a variable rectangular electron beam exposure machine is a rectangle.
可变矩形电子束曝光机的基本曝光图形是矩形。
A new type high accuracy high voltage D. C. power supply used for electron beam exposure sysfem is described.
本文介绍一种电子束曝光机用新型精密高压电源。
In this paper, the principle of electron beam write wafer is discussed briefly distinguish topography mark, and make the technology of wafer mark which is found by the electron beam exposure system.
本文扼要介绍了电子束直写圆片的原理，地形标记的识别，以及电子束曝光系统能识别的圆片标记的制造技术。
Food is irradiated by brief exposure to X-rays, gamma rays or an electron beam.
食品通过短暂地暴露在x射线、γ射线或电子束来进行辐照杀菌。
The present results not only can help to optimize the exposure conditions in Electron Beam Lithography, but also supply more accurate data for proximity effect correction.
本文的模拟结果不仅能为高能电子束光刻工艺优化曝光条件、降低邻近效应提供理论指导，而且能为进一步的邻近效应的校正提供更精确的数据。
These coatings may be cured via chemical means, thermally, or by exposure to UV or electron beam radiation.
这些涂料可以通过化学方法固化、热固化或通过暴露到UV或电子束辐射下固化。
These coatings may be cured via chemical means, thermally, or by exposure to UV or electron beam radiation.
这些涂料可以通过化学方法固化、热固化或通过暴露到UV或电子束辐射下固化。
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