The elementary exposure pattern of a variable rectangular electron beam exposure machine is a rectangle.
可变矩形电子束曝光机的基本曝光图形是矩形。
A new type high accuracy high voltage D. C. power supply used for electron beam exposure sysfem is described.
本文介绍一种电子束曝光机用新型精密高压电源。
In this paper, the principle of electron beam write wafer is discussed briefly distinguish topography mark, and make the technology of wafer mark which is found by the electron beam exposure system.
本文扼要介绍了电子束直写圆片的原理，地形标记的识别，以及电子束曝光系统能识别的圆片标记的制造技术。
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