脉冲高能量密度等离子体是一项全新的等离子体材料表面处理和薄膜制备技术。
The use of pulsed high energy density plasma is a new low temperature plasma technology for material surface treatment and thin film deposition.
特别是随着高温超导薄膜制备技术的不断提高，使其在电子信息领域中得到非常好的应用。
Especially, the High Temperature Superconductive (HTS) film is widely used in electronic field, as its manufacture technology improved continuously.
综述了透明导电氧化物（TCO）薄膜的结构、光电性能以及TCO薄膜制备技术的研究进展。
Progresses in research on microstructure, electrical and optical properties and preparation technology of TCO thin films are reviewed.
特别是随着高温超导薄膜制备技术的不断提高，使得其在电子信息等领域中的应用前景越来越被人们看好。
Especially with the continuous improvement of high-temperature superconducting thin film technology, it has an optimistic prospect of being widely used in the electronic information field.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
Magnetron Sputtering Technology has been applied in the field of film preparing widely, however, the quality of the film is influenced by stability of target current badly.
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different substrate temperatures (T_s).
本文分别从这两个方向综述了目前国外晶体硅薄膜电池制备技术的最新进展，最新实验室研究结果。
In this paper, the preparation technology as well as the latest results of crystalline silicon thin film solar cells in terms of two routes is reviewed.
磁控溅射技术是现代材料制备的重要方法之一，特别是在薄膜的制备过程中显得更为重要。
The technology of magnetron sputtering is an important method of preparing new materials in modern times, especially in the process of preparation of films.
热敏薄膜电阻制备是非致冷微测辐射热计红外焦平面的一项关键技术。
Preparation of thermal sensitive thin film resistor is one of key technologies in uncooled micro bolometer IR FPA fabrication.
本文主要介绍了AZO薄膜的晶体结构、导电机理、光电性能、典型制备技术和应用现状，并对其研究前景进行了展望。
In this paper, the structure, electric mechanism, photoelectric properties, typical preparation techniques and recent progress of AZO films are mainly described.
制备半导体膜的固定化是解决这一问题的有效途径之一，而溶胶凝胶技术可以实现薄膜的固定化。
The immobility of semiconductor thin films is one of the effective methods to solve this problem, while sol-gel technology can realize the immobility of thin films.
着重分析了钽酸锂薄膜材料的新制备技术，以及在热释电红外传感器应用方面的研究现状；
The recent researches of the new preparation technologies of the LiTaO3 thin film and its applications in pyroelectric infrared sensors are summarized in detail.
采用脉冲激光烧蚀技术在氩气环境下制备了纳米硅薄膜，研究了环境气体压强对纳米硅薄膜表面形貌的影响。
In argon (ar) gas, nanocrystalline silicon films are prepared by pulsed laser ablation. The influence of ambient pressure on surface morphology of nanocrystalline silicon film is studied.
等离子体中离子、原子或分子具有高的反应活性，等离子体技术在金刚石薄膜的制备中有着广泛应用。
Plasma includes many reactive species such as ions, atoms and molecules, and as result it has wide applications in the preparation of diamond films.
陶瓷薄膜的制备技术多种多样，如物理气相沉积、化学气相沉积、高温烧结和“溶胶-凝胶”法等。
There are many techniques for fabricating ceramic films such as PVD, CVD, high-temperature sintering and sol-gel method.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
Magnetron sputtering process has widely been applied to thin film preparation, during which, the quality of thin film is affected badly by the current stability of target.
本文介绍了有关低介电常数材料薄膜的制备方法和基本特性的检测技术。
In this paper, we introduced the technologies used in preparation and test of low-dielectric-constant materials.
显然，该发现和研究对于丰富晶体生长动力学知识及指导利用电化学技术制备晶态薄膜都具有重要意义。
Obviously, these findings will enrich the knowledge of crystal growth dynamics and conduct the experiments of thin film growth by using electrochemical technique.
对目前在非致冷微测辐射热计研制中得到成功应用的氧化钒薄膜的特性、制备及表征技术进行综述。
The properties, preparation and characteristics of vanadium oxide thin film, which has been successfully used in un cooled micro bolometer fabrication, are reviewed.
开发先进的薄膜制备工艺技术。
采用过滤阴极真空电弧技术并施加一定的衬底负偏压，在P（100）单晶硅片上制备出四面体非晶碳薄膜。
Tetrahedral amorphous carbon (ta-C) films have been deposited on P-type (100) polished c-silicon wafer with different substrate negative bias by filtered cathodic vacuum arc technology.
电化学沉积薄膜技术工艺设备简单成本低，在半导体薄膜制备方面有很好的应用前景。
Electrochemical deposition is of simple and low cost method, displaying a potential application in the deposition of semiconductor films.
研究表明，原电池电化学技术为某些功能陶瓷薄膜的制备提供了一条环境协调的、廉价便利的工艺新路线。
The results indicate that cell electrochemical technique provides an environmental, cheaper and convenient new routine to prepare some functional ceramic thin films.
PZT薄膜的微图形化是制备基于PZT薄膜微传感器和微驱动器的关键技术之一。
Micro-patterning of PZT thin film is one of the key technologies in the fabrication of micro-sensors and micro-actuators made of PZT films.
采用VHF-PECVD技术制备了不同衬底温度的微晶硅薄膜样品。
Series of microcrystalline silicon thin films were fabricated by VHF-PECVD at different substrate temperatures (Ts).
射频辉光放电硅烷等离子体化学汽相沉积是制备氢化非晶硅薄膜的主要工艺技术。
Plasma chemical vapor deposition in silane radio frequency glow discharge is a main fabrication technology of hydrogenated amorphous silicon (a-Si: h) films.
利用脉冲激光烧蚀技术在硅衬底上制备了类石墨薄膜，以该薄膜为阴极进行了场致电子发射实验。
The graphite-like film was prepared on silicon substrate by pulsed laser ablation, and the field electron emission from the film was measured.
利用脉冲激光烧蚀技术在硅衬底上制备了类石墨薄膜，以该薄膜为阴极进行了场致电子发射实验。
The graphite-like film was prepared on silicon substrate by pulsed laser ablation, and the field electron emission from the film was measured.
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