摘要 ：总结了大尺寸衍射光学元件离子束刻蚀技术的研究进展。
Abstract : Ion beam etching technologies for developing large aperture Diffractive Optical Elements (DOEs) were reviewed.
使用薄膜沉积法和离子束刻蚀法制作16阶菲涅耳透镜，应用于折衍混合CCD相机。
The 16-step Fresnel lens had been fabricated by thin film deposition and ion beam etching and it has been used in refractive-diffractive CCD camera.
介绍了离子束刻蚀的二次效应对图形轮廓以及离子束刻蚀入射角对图形侧壁陡度的影响。
The influence of quadratic effect of ion-beam etching on pattern profile and the influence of ion-beam etching incidence Angle on slope of pattern sidewall are studied.
由于对离子束刻蚀工艺和镀膜工艺的精细控制，光栅的槽形参数及多层膜参数良好地满足了设计要求。
The fabrication process is carefully controlled so that the grating groove and multilayer-coating parameters well meet the design targets.
利用离子束刻蚀(IBE)和反应离子刻蚀(RIE)等干法刻蚀方法来制造带栅极的场发射阴极阵列。
The gated silicon field emitter arrays (FEA) with small gate aperture have been successfully fabricated by dry etching, including ion beam etching (IBE) and reactive ion etching (RIE).
利用反应离子束刻蚀等微纳超精细加工而成的多层电介质结构反射镜可在高功率条件下实现啁啾脉冲的光谱整形。
The multilayer dielectric thin film reflector fabricated by top-down nano-fabrication processes can be used to realize the spectral reshaping of high power chirped pulses.
根据目前的实验研究报道，这种周期结构金属薄膜通常利用聚焦离子束刻蚀工艺来获得，器件的光学响应在可见光波段和近红外波段。
In most of the experiments reported to date, the perforated metal films were fabricated by the focused-ion-beam method, and their transmission enhancement was in the visible and near-infrared regions.
在薄膜沉积和离子束刻蚀技术中，通常要给绝缘基片加上一个射频或脉冲电极，以便在绝缘基片上形成一个自偏压来控制轰击到绝缘基片表面的离子能量。
Self-bias voltage of the dielectric substrate surface and voltage of the driven electrode were experimentally studied to improve the energy control of impinging ion in plasma processes.
低能离子束注入对细胞的刻蚀作用提供了外源遗传物质进入细胞的途径。
Ion implantation may echo on plant cell, thus provide convenicence for foreign genetic material transferring into cell.
衍射光学元件的制作技术主要包括激光或电子束直写、反应离子刻蚀、离子束铣及薄膜沉积。
DOE's fabrication techniques mainly include laser beam or electron beam writing, RIE, ion milling and thin film deposition.
应用于啁啾脉冲放大技术中的脉宽压缩光栅是基于多层膜作为基底，利用全息干涉技术和离子束技术刻蚀而成。
Pulse compressed gratings (PCG) used in chirped-pulse amplification system and based on multi-layer thin film stack are etched with ion-beam and holographic techniques.
应用于啁啾脉冲放大技术中的脉宽压缩光栅是基于多层膜作为基底，利用全息干涉技术和离子束技术刻蚀而成。
Pulse compressed gratings (PCG) used in chirped-pulse amplification system and based on multi-layer thin film stack are etched with ion-beam and holographic techniques.
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