离子束刻蚀也称为离子铣，是指当定向高能离子向固体靶撞击时,能量从入射离子转移到固体表面原子上，如果固体表面原子间结合能低于入射离子能量时，固体表面原子就会被移开或从表面上被除掉。通常离子束刻蚀所用的离子来自惰性气体。
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摘要 ： 总结了大尺寸衍射光学元件离子束刻蚀技术的研究进展。
Abstract : Ion beam etching technologies for developing large aperture Diffractive Optical Elements (DOEs) were reviewed.
使用薄膜沉积法和离子束刻蚀法制作16阶菲涅耳透镜，应用于折衍混合CCD相机。
The 16-step Fresnel lens had been fabricated by thin film deposition and ion beam etching and it has been used in refractive-diffractive CCD camera.
介绍了离子束刻蚀的二次效应对图形轮廓以及离子束刻蚀入射角对图形侧壁陡度的影响。
The influence of quadratic effect of ion-beam etching on pattern profile and the influence of ion-beam etching incidence Angle on slope of pattern sidewall are studied.
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