为满足纳米级电子束曝光系统的要求，设计了高速图形发生器。
The high speed Patten Generator is designed for nanometer E-beam lithography system.
本文扼要介绍了电子束直写圆片的原理，地形标记的识别，以及电子束曝光系统能识别的圆片标记的制造技术。
In this paper, the principle of electron beam write wafer is discussed briefly distinguish topography mark, and make the technology of wafer mark which is found by the electron beam exposure system.
介绍了将商用透射电镜JEM- 2000 EX改造为高能电子束曝光系统的研制工作，在现阶段研制工作的基础上进行了曝光实验。
The research work about modifying a commercial transmission electron microscope (JEM-2000EX) into a lithography system is introduced, and the experiments are carried out on this system.
介绍了将商用透射电镜JEM- 2000 EX改造为高能电子束曝光系统的研制工作，在现阶段研制工作的基础上进行了曝光实验。
The research work about modifying a commercial transmission electron microscope (JEM-2000EX) into a lithography system is introduced, and the experiments are carried out on this system.
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