利用非平衡磁控溅射技术在单晶硅基底上沉积了类石墨非晶碳膜。
Graphitelike carbon film was deposited on silicon substrates by unbalanced magnetron sputtering.
磁控溅射技术是现代材料制备的重要方法之一，特别是在薄膜的制备过程中显得更为重要。
The technology of magnetron sputtering is an important method of preparing new materials in modern times, especially in the process of preparation of films.
综述了各种沉积条件对磁控溅射技术生长氮化铝薄膜的微观结构，电学以及光学性能的影响。
Reviewed were the effects of various deposition conditions on microstructural, electrical and optical properties of AlN films grown by magnetron sputtering deposition technology.
采用射频磁控溅射技术在不同射频功率下沉积了ITO薄膜，并将其应用于HIT太阳电池。
ITO thin films were prepared by radio-frequency magnetron sputtering technique at different sputtering power, and applied to HIT solar cells.
结合磁控溅射技术设计制作了薄膜型多孔硅乙醇气敏元件，吸附乙醇时具有良好的电阻和电容响应。
Combining magnetron sputtering technology designs and makes membrane porous silicon sensor, it has good resistance and capacitance response when adsorbs alcohol.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
Magnetron Sputtering Technology has been applied in the field of film preparing widely, however, the quality of the film is influenced by stability of target current badly.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
Magnetron sputtering process has widely been applied to thin film preparation, during which, the quality of thin film is affected badly by the current stability of target.
真空溅射镀膜技术及设备在当今和未来都拥有十分广阔的应用领域和发展前景。
The technology and equipment of the vacuum sputtering coating have the extremely broad application and the development in the future.
用激光溅射-分子束技术，研究了几种过渡金属离子与乙腈团簇分子的气相化学反应。
Reactions of transition metals with acetonitrile clusters in the gas phase are studied using laser ablation-molecule beam technique.
本文介绍了等离子增强磁控溅射沉积技术。
This article presents an introduction to Plasma enhanced, magnetron sputtered deposition Technology.
激光烧蚀溅射沉积薄膜技术是一项新的固体薄膜制造技术。
The fabricating technique of thin solid films deposited by pulsed laser ablating spray is a new technique.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
在离子束溅射和离子辅助沉积光学薄膜技术中，离子源是其中最关键的单元技术之一。
In ion-beam sputtering deposition and ion-beam aid deposition thin film techniques, ion-beam source is one of the key techniques.
用真空溅射镀膜技术在掘进机截齿上镀碳化钛膜，使其硬度明显提高，寿命延长3～5倍。
TiC membrane-plated on the pick of heading machine, the hardness is improved, and the work-life is lengthened for 3~5 times.
本文介绍了新型硬质涂层和硬质涂层沉积技术中电弧离子镀和磁控溅射镀技术的新进展。
Makes a survey about the recent develpment of new deposition techniques for hard thin film coatings.
该薄膜可采用高真空热蒸发、电子束沉积以及溅射等多种镀膜技术制备。
The thin film can be prepared by a plurality of film plating techniques such as high vacuum thermal evaporation, electron beam deposition and sputtering.
用RFMS-4射频磁控溅射仪制备纳米多层膜技术稳定可靠，在优化工艺条件下能保证薄膜成分和溅射速率的稳定性。
The concentration and deposition rate of the films are controllable with the optimization parameters on the RFMS-4 sputtering apparatus.
利用离子溅射镀膜技术镀制了所设计的膜片并且给出了测量结果。
The newly designed films of green HeNe laser have been coated by making use of ion beam sputtering deposition, and the measured results have been given out.
并采用高真空磁控溅射镀膜技术将敏感膜溅射在光纤端面、硅片、有机玻璃上。
Using high vacuum magnetron sputtering system, it is coated sensitive film on the optical fiber end face, silicon, glass.
利用X -射线衍射技术对溅射沉积在非晶二氧化硅基底上的金属晶体超微粒的生长特性进行实验研究。
Using X-ray diffraction technique, the process of the crystal growth of metal ultrafine particles, which are prepared by sputtering method and deposited on the silica! Substrate, have been researched.
本实用新型属磁控溅射镀膜技术，具体涉及一种磁控溅射装置。
The utility model belongs to a magnetic control sputtering film coating technology and relates to a magnetic control sputtering device in particular.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
采用磁控溅射制备的合金表面膜层具有防腐蚀性能优异、耐磨性强等优点，其作为镁合金表面处理技术具有良好的发展趋势。
The coatings deposited by magnetron sputtering technology have good corrosion and wear resistance. This technique shows optimistic development trend in the field of magnesium alloys surface treatment.
给出了金属靶阴极表面溅射清洗效果的伏安特性评价法，为克服“靶中毒”提供了有效的技术途径。
The evaluating method of sputtering cleanout effect on metal target surface by volt-ampere characteristic of target cathode has been given, which provides effective approach to eliminate...
给出了金属靶阴极表面溅射清洗效果的伏安特性评价法，为克服“靶中毒”提供了有效的技术途径。
The evaluating method of sputtering cleanout effect on metal target surface by volt-ampere characteristic of target cathode has been given, which provides effective approach to eliminate...
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